Designed as the ultimate IAD ion source for PVD processes in small chambers with minimal pumping speed
Designed for installation to chambers with very small pumping speed – as low as 200 litres per second
- Requires only 3 sccm of gas flow to produce 1 amp of beam current.
- Can be completely mounted from one 63 CF flange
- Small physical size – head measures only 50mm diameter
- Produces up to 200μA/cm2 at a work distance of 150mm
- Very low maintenance – supplied with Patented TiN coated anode for ease of cleaning and stable operation
- Dual gas option available – oxygen or argon available by Touch Screen selection.
- Bakeable to 300ºC
Optional Features Available
Dual Gas DG. This feature provides use of either pure gas delivery or a mixture of two gases in any ratio. Refer System Specification for detail.
Mounting Hardware MH. Several options are available. The mounting brackets are clamped to a special gas feed-through. Refer System Specification for detail
Beam Profile Enhancer.
The standard wide angle beam distribution can be modified to deliver a considerably narrower beam profile with no degradation of ion generating performance.
Refer System Specification for detail.
